Systems and methods for determining width/space limits for a...

Details Systems and methods for determining width/space limits for a... Systems and methods for determining width/space limits for a...

2011-06-28

2011-06-28

Patel, Ramesh B (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C430S005000, C430S030000, C355S018000, C355S053000

Reexamination Certificate

active

07970485

ABSTRACT:
Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

REFERENCES:
patent: 6243855 (2001-06-01), Kobayashi et al.
patent: 6677089 (2004-01-01), Ogino et al.
patent: 7057715 (2006-06-01), Robinson
patent: 7346878 (2008-03-01), Cohen et al.
patent: 2003/0177467 (2003-09-01), Ohnuma et al.
patent: 2006/0095887 (2006-05-01), Bigwood et al.
patent: 2006/0141365 (2006-06-01), Toyama et al.

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