Systems and methods for determining width/space limits for...

Details Systems and methods for determining width/space limits for... Systems and methods for determining width/space limits for...

2005-01-19

2009-06-23

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000

Reexamination Certificate

active

07550237

ABSTRACT:
Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

REFERENCES:
patent: 6677089 (2004-01-01), Ogino et al.
patent: 7057715 (2006-06-01), Robinson
patent: 2006/0095887 (2006-05-01), Bigwood et al.

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