Systems and methods for determining semiconductor wafer temperat

Details Systems and methods for determining semiconductor wafer temperat Systems and methods for determining semiconductor wafer temperat

1997-04-15

1999-05-11

Paschall, Mark

Electric heating

Heating devices

With power supply and voltage or current regulation or...

219505, 374 1, 374178, 437248, H05B1/02

Patent

active

059025042

ABSTRACT:
The present invention provides methods of calibrating a deposition device, which is preferably a vapor deposition device, and more preferably is a physical vapor deposition device. One of the methods includes the steps of: (1) determining a resistance-temperature relationship of a substance located on a semiconductor wafer, a resistance of the substance being a function of a temperature of said semiconductor wafer; (2) placing the semiconductor wafer in the deposition device; (3) heating the heater to a known temperature; and (4) measuring a resistance of the substance, the resistance-temperature relationship allowing a relationship between a temperature of the semiconductor wafer and the known temperature to be determined, thereby to allow the deposition device to be calibrated.

REFERENCES:
patent: 3634151 (1972-01-01), Sato et al.
patent: 4739258 (1988-04-01), Schwarz
patent: 4891497 (1990-01-01), Yoshimura
patent: 5232509 (1993-08-01), Min et al.
patent: 5350899 (1994-09-01), Ishikawa et al.
patent: 5718511 (1998-02-01), Mundt
patent: 5769540 (1998-06-01), Schietinger et al.
Publication entitled Thin Film Interactions of A1 and A1(Cu) On W and T1; Electrochemical Society; Extend Abstracts; vol. 83-1; 1983, p. 681.
Publication entitled "Effect of Si on the Reaction Kinetics of Ti/AISi Bilayer Structures" by R.K. Nahar and N.M. Devashrayee; Appl. Phys. Lett. 50 (3); Jan. 19, 1987; pp. 130-131.

Affiliated with

Also associated with

Rating

Systems and methods for determining semiconductor wafer temperat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Systems and methods for determining semiconductor wafer temperat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for determining semiconductor wafer temperat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-244038