Systems and methods for determining semiconductor wafer temperat

Electric heating – Heating devices – With power supply and voltage or current regulation or...

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219505, 374 1, 374178, 437248, H05B1/02

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active

059025042

ABSTRACT:
The present invention provides methods of calibrating a deposition device, which is preferably a vapor deposition device, and more preferably is a physical vapor deposition device. One of the methods includes the steps of: (1) determining a resistance-temperature relationship of a substance located on a semiconductor wafer, a resistance of the substance being a function of a temperature of said semiconductor wafer; (2) placing the semiconductor wafer in the deposition device; (3) heating the heater to a known temperature; and (4) measuring a resistance of the substance, the resistance-temperature relationship allowing a relationship between a temperature of the semiconductor wafer and the known temperature to be determined, thereby to allow the deposition device to be calibrated.

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