Systems and methods for controlling the temperature and uniformi

Details Systems and methods for controlling the temperature and uniformi Systems and methods for controlling the temperature and uniformi

1994-03-30

1995-08-08

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, H01J 37317

Patent

active

054401321

ABSTRACT:
An implantation system (10) is provided that comprises a rotating drum (12) which holds a wafer chuck (28) which in turn holds a semiconductor wafer (26). The wafer chuck (28) rotates during the implantation of oxygen from an oxygen beam (24) created by a beam generator (22). The wafer chuck (28) is rotated via shaft (30) from a motor (32). The wafer chuck (28) also holds a thermal reflector (36) which allows for control of the temperature of the wafer during the implantation process.

REFERENCES:
patent: 4831270 (1989-05-01), Weisenberger
patent: 5084624 (1992-01-01), Lamure et al.

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