Systems and methods for closed loop defect reduction

Details Systems and methods for closed loop defect reduction Systems and methods for closed loop defect reduction

2007-06-26

2007-06-26

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C205S082000, C438S004000, C438S012000, C702S035000, C716S030000

Reexamination Certificate

active

10342819

ABSTRACT:
Systems and methods for repairing defects on a specimen are provided. A method may include processing a specimen, detecting defects on the specimen, and repairing one or more of the defects. An additional method may include detecting defects on a specimen, repairing one or more of the defects, and inspecting the specimen to detect defects remaining on the specimen subsequent to repair. A system may include a process chamber, a measurement device configured to detect defects on a specimen, and a repair tool configured to repair one or more of the defects detected on the specimen. An additional system may include a measurement device, a repair tool, and an inspection tool configured to detect defects remaining on the specimen subsequent to repair. The systems may also include a processor configured to alter a parameter of an instrument coupled to the repair tool in response to output from the measurement device.

REFERENCES:
patent: 4247203 (1981-01-01), Levy et al.
patent: 4347001 (1982-08-01), Levy et al.
patent: 4378159 (1983-03-01), Galbraith
patent: 4448532 (1984-05-01), Joseph et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
patent: 4556317 (1985-12-01), Sandland et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 4601576 (1986-07-01), Galbraith
patent: 4618938 (1986-10-01), Sandland et al.
patent: 4633504 (1986-12-01), Wihl
patent: 4641967 (1987-02-01), Pecen
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4766324 (1988-08-01), Saadat et al.
patent: 4805123 (1989-02-01), Specht et al.
patent: 4818110 (1989-04-01), Davidson
patent: 4845558 (1989-07-01), Tsai et al.
patent: 4877326 (1989-10-01), Chadwick et al.
patent: 4898471 (1990-02-01), Stonestrom et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 4928010 (1990-05-01), Saito et al.
patent: 5023424 (1991-06-01), Vaught
patent: 5076692 (1991-12-01), Neukermans et al.
patent: 5189481 (1993-02-01), Jann et al.
patent: 5241176 (1993-08-01), Yonezawa
patent: 5264912 (1993-11-01), Vaught et al.
patent: 5293216 (1994-03-01), Moslehi
patent: 5355212 (1994-10-01), Wells et al.
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5537669 (1996-07-01), Evans et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5565979 (1996-10-01), Gross
patent: 5572598 (1996-11-01), Wihl et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5604585 (1997-02-01), Johnson et al.
patent: 5633747 (1997-05-01), Nikoonahad
patent: 5665968 (1997-09-01), Meisburger et al.
patent: 5717204 (1998-02-01), Meisburger et al.
patent: 5737072 (1998-04-01), Emery et al.
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5822055 (1998-10-01), Tsai et al.
patent: 5825482 (1998-10-01), Nikoonahad et al.
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5869833 (1999-02-01), Richardson et al.
patent: 5872358 (1999-02-01), Todokoro et al.
patent: 5883710 (1999-03-01), Nikoonahad et al.
patent: 5917588 (1999-06-01), Addiego
patent: 5973323 (1999-10-01), Adler et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6020214 (2000-02-01), Watanabe et al.
patent: 6020957 (2000-02-01), Rosengaus et al.
patent: 6052478 (2000-04-01), Wihl et al.
patent: 6064517 (2000-05-01), Chuang et al.
patent: 6078386 (2000-06-01), Tsai et al.
patent: 6081325 (2000-06-01), Leslie et al.
patent: 6122046 (2000-09-01), Almogy
patent: 6175645 (2001-01-01), Elyasaf et al.
patent: 6178257 (2001-01-01), Alumot et al.
patent: 6201998 (2001-03-01), Lin et al.
patent: 6201999 (2001-03-01), Jevtic
patent: 6205239 (2001-03-01), Lin et al.
patent: 6215551 (2001-04-01), Nikoonahad et al.
patent: 6224638 (2001-05-01), Jevtic et al.
patent: 6242273 (2001-06-01), Goodwin et al.
patent: 6483938 (2002-11-01), Hennessey et al.
patent: 6542830 (2003-04-01), Mizuno et al.
patent: 6797526 (2004-09-01), Tanaka et al.
patent: 6919957 (2005-07-01), Nikoonahad et al.
patent: 6946394 (2005-09-01), Fielden et al.
patent: 6949177 (2005-09-01), Jeong
patent: 2004/0101981 (2004-05-01), Morishita
patent: 0 993 019 (2000-04-01), None
patent: 1 061 358 (2000-12-01), None
patent: 1 061 571 (2000-12-01), None
patent: 1 069 609 (2001-01-01), None
patent: 1 081 489 (2001-03-01), None
patent: 1 081 742 (2001-03-01), None
patent: 1 093 017 (2001-04-01), None
patent: 98/54632 (1998-12-01), None
patent: WO 99/65056 (1999-12-01), None
patent: 00/36525 (2000-06-01), None
patent: 00/68673 (2000-11-01), None
patent: 00/70332 (2000-11-01), None
patent: 01/03145 (2001-01-01), None
patent: 01/13098 (2001-02-01), None
patent: WO 01/80304 (2001-12-01), None
Genut et al., “Chemically Assisted Laser Removal of Photoresist and Particles from Semiconductor Wafers,” Meeting of the Fine Particle Society, Apr. 1988, 10 pages.
Silverman, “Laser microchemical technology enables real-time editing a first-run silicon,” Solid State Technology, Sep. 1996, 4 pages.
International Search Report, application No. PCT/US 03/01419, mailed Feb. 17, 2004.

Affiliated with

Also associated with

Rating

Systems and methods for closed loop defect reduction does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Systems and methods for closed loop defect reduction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for closed loop defect reduction will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3885332