Systems and methods for charging a cleaning solution used...

Details Systems and methods for charging a cleaning solution used... Systems and methods for charging a cleaning solution used...

2011-03-29

2011-03-29

Kornakov, Michael (Department: 1712)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S036000, C510S175000

Reexamination Certificate

active

07914624

ABSTRACT:
Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate.The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.The cleaning compositions of the present invention include: a solvent; and a solute selected to promote cleaning of the IC substrate, wherein at least a portion of the solute is present in cluster form in the solution and the solute and solvent are present in a volumetric ratio that is between about 3×10−5:1 and about 1×10−24:1.

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