Systems and methods for beam angle adjustment in ion implanters

Details Systems and methods for beam angle adjustment in ion implanters Systems and methods for beam angle adjustment in ion implanters

2008-07-15

2008-07-15

Nguyen, Kiet T (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

11716622

ABSTRACT:
An ion implantation system employs a mass analyzer for both mass analysis and angle correction. An ion source generates an ion beam along a beam path. A mass analyzer is located downstream of the ion source that performs mass analysis and angle correction on the ion beam. A resolving aperture within an aperture assembly is located downstream of the mass analyzer component and along the beam path. The resolving aperture has a size and shape according to a selected mass resolution and a beam envelope of the ion beam. An angle measurement system is located downstream of the resolving aperture and obtains an angle of incidence value of the ion beam. A control system derives a magnetic field adjustment for the mass analyzer according to the angle of incidence value of the ion beam from the angle measurement system.

REFERENCES:
patent: 5483077 (1996-01-01), Glavish
patent: 6242750 (2001-06-01), Takahashi et al.
patent: 6881966 (2005-04-01), Benveniste et al.
patent: 7227160 (2007-06-01), Vanderberg et al.
patent: 2003/0042427 (2003-03-01), Sullivan et al.
patent: 2006/0219955 (2006-10-01), Ray
patent: 2007/0145298 (2007-06-01), Freer et al.

Affiliated with

Also associated with

Rating

Systems and methods for beam angle adjustment in ion implanters does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Systems and methods for beam angle adjustment in ion implanters, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Systems and methods for beam angle adjustment in ion implanters will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3957092