Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-10-18
2005-10-18
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500
Reexamination Certificate
active
06956644
ABSTRACT:
A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.
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Biellak Steve
Stokowski Stanley E.
Vaez-Iravani Mehdi
KLA-Tencor Technologies Corporation
Parsons Hsue & de Runtz LLP
Pham Hoa Q.
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