Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-01-17
2006-01-17
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C073S105000, C427S552000, C427S596000, C438S676000, C438S771000, C977S726000, C977S726000, C977S726000
Reexamination Certificate
active
06987277
ABSTRACT:
A method for manipulating a nanoscale object deposited on a substrate. The surface of the substrate is passive. A target position is formed on the passive surface by the action of the tip of a scanning probe microscope. The nanoscale object is picked from its initial position by the tip of the scanning probe microscope, then placed and released at the target position.
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Baur Christof
Stallcup, II Richard E.
Berman Jack I.
Haynes and Boone LLP
Zyvex Corporation
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