Systematic method for production of phase-shifting photolithogra

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 22, 430321, 430322, G03F 900

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055276458

ABSTRACT:
A systematic method of producing a mask for use within a photolithographic illumination system characterized by a transmission function in which light is transmitted through non-opaque portions of the mask positioned in an object plane and in which an image is formed on an image plane is disclosed herein. The method includes the steps of defining a binary image pattern to be formed by the illumination system on the image plane; generating a continuous mask function of continuously-varying phase which satisfies predetermined error criteria based on the transmission function and the binary image pattern; transforming the mask function into a quadrature-phase mask function by dividing the continuously-varying phase into four phase levels; and generating the mask in accordance with the quadrature-phase mask function, wherein the mask includes a plurality of pixel regions each of which has a transmittance corresponding to one of the four phase levels.

REFERENCES:
patent: 5326659 (1994-07-01), Liu et al.
Modeling Phase Shifting Masks, Neureuther Andrew R., BACUS Symposium Paper, (Sep. 26, 1990).

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