System to increase throughput in a dual substrate stage...

Details System to increase throughput in a dual substrate stage... System to increase throughput in a dual substrate stage...

2006-05-30

2006-05-30

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S053000, C355S075000

Reexamination Certificate

active

07053990

ABSTRACT:
A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle patterns a first set of substrates, during a second exposure period a second reticle patterns the first set of substrates and a second set of substrates, and during a third exposure period the first reticle patterns the second set of substrates, etc. This can continue with further pairs of substrates until all desired substrates are patterned. It is to be appreciated that after the first and second reticles are complete, third and fourth reticles can pattern the first and second, sets of substrates. As another example, other sequences can also be performed using four exposure periods.

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patent: 2004/0257551 (2004-12-01), Galburt et al.

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