System, method and apparatus for filament and support used...

Details System, method and apparatus for filament and support used... System, method and apparatus for filament and support used...

2007-12-06

2011-10-04

Chen, Keath (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C219S411000, C219S391000, C219S496000, C361S278000, C361S299200, C361S298400, C361S306100, C361S309000, C361S669000, C361S823000, C361S520000, C361S538000, C361S540000

Reexamination Certificate

active

08028653

ABSTRACT:
A filament post used in plasma-enhanced chemical vapor deposition has an outer shell and an inner post. An electrical potential is applied only to the inner post to ensure that there is no impact on the plasma density and the carbon film properties. The inner post and the outer shell are electrically insulated by ceramic insulators, such that no electrical potential is applied to outer shell. The stress generated in the carbon film is directly related to the electrical potential of the surface to which the film is deposited. The carbon film deposited on the outer shell of the post is not highly stressed, which significantly reduces film delamination from the filament post surfaces.

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