Liquid purification or separation – With means to add treating material – With distinct reactor tank – trough or compartment
Patent
1997-04-02
1999-02-02
Woo, Jay H.
Liquid purification or separation
With means to add treating material
With distinct reactor tank, trough or compartment
210206, 210218, 55237, 96181, 96216, 261 792, 261DIG42, 261DIG75, B01D 1900
Patent
active
058659951
ABSTRACT:
A gas treatment system for liquids can increase gas exposure and contact time. A liquid stream into which treatment gas is added is directed into a vortex chamber (130). The vortex chamber (130) creates a downward spiral flow of the liquid stream forcing it into an upper end inlet (145) of a contact tank (114). The liquid stream with entrained gas bubbles is forced to move downwardly through the tank to a lower end outlet (122). The flow then moves upwardly to a degassing chamber (146) wherein the treatment gas is separated from the liquid and delivered through an outlet (124) for use. Because the entrained bubbles are forced downwardly through the contact tank (114), the gas bubbles remain quite small and contact time is prolonged. Release of the treatment gas is further facilitated by positioning the degassing chamber (146) at an elevated position which promotes gas bubble expansion, combination and release.
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Barnard Delbert J.
Morrison Betsey J.
Woo Jay H.
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