System for the galvanic deposition of metals such as aluminum

Details System for the galvanic deposition of metals such as aluminum System for the galvanic deposition of metals such as aluminum

1981-06-03

1984-04-24

Williams, Howard S.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204207, C25D 1702, C25D 706

Patent

active

044446365

ABSTRACT:
A system for the galvanic deposition of aluminum incorporating a tubular cell through which goods to be treated can be moved in the axial direction. An electrolyte is pumped through the tubular cell preferably with the aid of an electrolyte circulating system which is self-contained. The electrolyte is gated out by means of T-shaped connecting components which are adjoined by airlock arrangements associated with the tubular cell.

REFERENCES:
patent: 1590599 (1926-06-01), Taylor
patent: 2445675 (1948-07-01), Lang
patent: 3267008 (1966-08-01), Smith et al.
patent: 3474009 (1966-10-01), Wang
patent: 3592746 (1971-07-01), Hespenhaide
patent: 3658680 (1972-04-01), Combe et al.
patent: 3661752 (1972-05-01), Capper et al.
patent: 3778355 (1973-12-01), Johnson et al.
patent: 3865701 (1975-02-01), Borgmann

Affiliated with

Also associated with

Rating

System for the galvanic deposition of metals such as aluminum does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for the galvanic deposition of metals such as aluminum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for the galvanic deposition of metals such as aluminum will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-114495