Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-09-04
2007-09-04
Pham, Hoa Q. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500
Reexamination Certificate
active
10978527
ABSTRACT:
A system for the detection of macrodefects is disclosed, the system being surrounded by a housing (50) and being subdivided into a first segment (6), a second segment (8), and a third segment (10). Provided in the second segment (8) is a stage (2), displaceable in the X direction and Y direction, on which a wafer (25) is placed. Located in the first segment (6) is an aspiration device (36) that directs aspirated air via an air guide (37) into the second segment (8), the air guide (37) encompassing several air-directing panels (38) so that an air flow (60) is guided in parallel fashion over the wafer (25).
REFERENCES:
patent: 5814116 (1998-09-01), Schneider et al.
patent: 6758876 (2004-07-01), Suzuki et al.
patent: 6842932 (2005-01-01), Ishihara
patent: 7022009 (2006-04-01), Kim
patent: 2005/0134839 (2005-06-01), Kreh et al.
patent: 2007/0040241 (2007-02-01), Halama et al.
patent: 43 10 149 (1994-10-01), None
patent: 195 38 040 (1997-04-01), None
patent: 10 2004 062 592 (2006-06-01), None
patent: 0 335 752 (1994-09-01), None
patent: 5-33767 (1993-02-01), None
patent: WO 2005/004208 (2005-01-01), None
Backhauss Henning
Kreh Albert
Schenck Rene
Foley & Lardner LLP
Pham Hoa Q.
Vistec Semiconductor Systems GmbH
LandOfFree
System for the detection of macrodefects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for the detection of macrodefects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for the detection of macrodefects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3751628