Liquid purification or separation – Processes – Chemical treatment
Patent
1994-08-10
1996-10-15
McCarthy, Neil
Liquid purification or separation
Processes
Chemical treatment
210764, 95263, 95265, B01D 1900
Patent
active
055651089
ABSTRACT:
A method of retarding the growth of algae in aqueous solution is disclosed. An aqueous medium is moved along a flow path in a direction terminating at an aqueous solution into which the aqueous medium is added. Before adding said aqueous medium into the aqueous solution, a gas stream having a nitrogen content in excess of 90% is injected into the aqueous solution in the same direction in which the aqueous solution is moved along the flow path. The gas stream is injected into the aqueous medium at a flow rate of at least 0.01 cubic feet per hour and said gas stream and said aqueous medium continue to intermix along said flow path prior to reaching the termination of the flow path at the aqueous solution.
REFERENCES:
patent: 1725925 (1929-08-01), Kent
patent: 1762784 (1930-06-01), Kriegsheim
patent: 2299553 (1942-10-01), McKinnis
patent: 2734028 (1956-02-01), Domogalla
patent: 3142615 (1964-07-01), Wehner
patent: 3247054 (1966-04-01), Hodge
patent: 3251357 (1966-05-01), Williamson
patent: 3258422 (1966-06-01), Ferry
patent: 3366441 (1968-01-01), Ellner et al.
patent: 4092943 (1978-06-01), Lund et al.
patent: 4260398 (1981-04-01), Ransohoff
patent: 4658757 (1987-04-01), Cook
patent: 4752401 (1988-06-01), Bodenstein
patent: 4872986 (1989-10-01), Stringfellow et al.
patent: 5015394 (1991-05-01), McEllhenney et al.
Dimesky Robert S.
Hursey Francis X.
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