System for supplying high-pressure medium gas

Details System for supplying high-pressure medium gas System for supplying high-pressure medium gas

1997-04-28

1998-08-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 219 74, 219390, 219420, C23C 1480

Patent

active

057922713

ABSTRACT:
The present invention provides a system for supplying a high-pressure medium gas suitable for processing a semiconductor to be processed by heating under isostatic pressure in a short cycle.
The system includes a gas holder containing a high-pressure medium gas, a compressor for pressurizing the high-pressure medium gas supplied from the gas holder, a high-pressure vessel having a heater, an accumulator for storing the high-pressure medium gas pressurized by the compressor, a first evacuation unit for evacuating the inside of a pipeline for the high-pressure medium gas, a vacuum casing for holding the opening of the high-pressure vessel in a vacuum, a second evacuation unit for evacuating the inside of the vacuum casing, and a valve unit for connecting the high-pressure vessel and the accumulator so that series connection and parallel connection can be switched on the outlet side of the compressor.

Affiliated with

Also associated with

Rating

System for supplying high-pressure medium gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for supplying high-pressure medium gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for supplying high-pressure medium gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-385214