System for separation of volatile substances from waste gases

Heating – Processes of heating or heater operation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

34 134, 34 165, 34 32, 34 73, 34 75, 34 79, F26B 304

Patent

active

044039484

ABSTRACT:
A process and apparatus for drying of materials such as wood chips or lacquers. A stream of hot gas is provided, the hot gas passes over the material to be dried, the now waste gas is removed from the material to be dried, the volatile substances are deposited from the waste gas and the deposited substances are moved to a collector location. Dust and similar materials can be also bonded during the depositing step. The deposited volatile substances can be removed by intermittent evaporation and/or sublimation and the volatile substances can be collected at a predetermined collector location, or by continuously washing out the volatile substances, or by compressing before cooling down and expanding after cooling down the volatile substances. Removing of deposited volatile substances may be triggered in response to a certain degree of dirtying or soiling and to passing predetermined threshold values of temperature and/or pressure and in accordance with a predetermined time plan, respectively.

REFERENCES:
patent: 1218616 (1917-03-01), Baker
patent: 1480804 (1924-01-01), Fish, Jr.
patent: 4329788 (1982-05-01), Sterlini
patent: 4339883 (1982-07-01), Waldmann

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System for separation of volatile substances from waste gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for separation of volatile substances from waste gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for separation of volatile substances from waste gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1728067

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.