Severing by tearing or breaking – Breaking or tearing apparatus – Including means to apply thermal shock to work
Patent
1975-03-27
1979-02-20
Simpson, Othell M.
Severing by tearing or breaking
Breaking or tearing apparatus
Including means to apply thermal shock to work
225103, B26F 300
Patent
active
041402600
ABSTRACT:
This invention relates to a system for separating a semiconductor wafer into a plurality of discrete pellets while maintaining the relative orientation that the pellets exhibited when in the wafer. The invention is carried out by first applying a ductile variable coupling layer to a surface of the wafer. The coupling layer is affixed to a stretchable membrane which, after the wafer is subdivided, is stretched to space the pellets from one another. The coupling material adheres more tightly to the membrane than to the wafer. A portion of the bond between the ductile coupling layer and the membrane is broken during stretch so that the pellets adhere less tightly to the coupling layer following stretch than prior thereto.
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patent: 3714704 (1973-02-01), Moore
patent: 3727282 (1973-04-01), Neary
patent: 3870196 (1975-03-01), Hargraves
General Electric Company
Mooney Robert J.
Salai Stephen B.
Simpson Othell M.
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