System for resist defect measurement

Details System for resist defect measurement System for resist defect measurement

1983-02-23

1984-09-25

Krawczewicz, Stanley T.

Electricity: measuring and testing

Measuring, testing, or sensing electricity, per se

Frequency of cyclic current or voltage

29574, G01R 3112, H01L 700

Patent

active

044737955

ABSTRACT:
A non-destructive test system for determining the number, size and location of pinhole defects in insulative coatings on a semiconductor substrate employing photocathodic current measurement at the semiconductor surface. This current is produced by contacting the coated semiconductor with an aqueous electrolyte, applying a small electrical bias with respect to a metal electrode, and scanning a small, focused light beam over the semiconductor surface. The frequency of current peaks produced is proportional to defect density. Current peaks provide data relative to defect size and location is correlated relative to scanning data to determine defect location.

REFERENCES:
patent: 3373353 (1968-03-01), Harris
patent: 3772520 (1973-11-01), Varker
patent: 3792458 (1974-02-01), Smith
patent: 4296372 (1981-10-01), Feuerbaum
Gale et al., "A Simple Optical Thin Film Deposition Monitor . . . ", J. Vac. Sci. Tech., 20(1), Jan. 1982.
Leachton, "Metal Deposition Technique for Pinhole Analysis . . . ", IBM Tech. Discl. Bull., vol. 19, No. 9, Feb. 1977.
Gniewek, "Evaluating Insulation Layer Quality . . . ", IBM Tech. Discl. Bull., vol. 14, No. 5, Oct. 1971.

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