Gas separation – Plural serial basically diverse separating media – Plural stages in unitary casing
Patent
1983-11-16
1985-08-27
Lacey, David L.
Gas separation
Plural serial basically diverse separating media
Plural stages in unitary casing
55347, B01D 5000
Patent
active
045376085
ABSTRACT:
A system for removing contaminant particles from a gas such as air includes an assembly of vortex air cleaners and a depth filter which are disposed in series in a passage through which the air flows so that the larger particles and liquid droplets are removed from the air by the cleaners and the finer particles and finely divided liquid particles are removed by the filter. The vortex air cleaners are arranged side by side in two perpendicular rows and the direction of the rotational flow imparted by each is of the opposite hand from the direction of flow imparted by each adjacent cleaner so that, in the regions where the flows from two adjacent cleaners interact, the flow vectors from the two cleaners are in the same direction. This maintains the rotational flows as the air travels to and enters the filter with the result that plugging of the upstream side of the filter is virtually eliminated and the full depth of the filter is effectively utilized.
REFERENCES:
patent: 1886548 (1932-11-01), Horne et al.
patent: 2341087 (1944-02-01), Dunham
patent: 2461677 (1949-02-01), Burdock et al.
patent: 2542549 (1951-02-01), McBride
patent: 3720046 (1973-03-01), Kudirka et al.
patent: 4158449 (1979-06-01), Sun et al.
patent: 4389307 (1983-06-01), Boadway
patent: 4394145 (1983-07-01), Sundseth
Lacey David L.
Pall Corporation
LandOfFree
System for removing contaminant particles from a gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for removing contaminant particles from a gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for removing contaminant particles from a gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2000090