System for rapidly producing either integrated circuits on a sub

Details System for rapidly producing either integrated circuits on a sub System for rapidly producing either integrated circuits on a sub

1995-03-29

1996-09-24

Chiesa, Richard L.

Plastic article or earthenware shaping or treating: apparatus

Means applying electrical or wave energy directly to work

Radiated energy

26427217, 264494, 346 77R, 353 99, 365126, B29C 3508

Patent

active

055588840

ABSTRACT:
A system for rapidly producing an integrated circuit on a substrate using a curable liquid capable of solidification to form a photo-resist pattern corresponding to an artwork representation of interconnections when subjected to ultra-violet light energy operates with a processor and computer aided design software. The system includes an x-y table, an electronically erasable mask, a drawing device and a projecting system. The substrate is disposed on the x-y table. The curable liquid lies in a solidification plane on the substrate. The electronically erasable mask is an ultra-violet wavelength isolating image buffer and is electrically coupled to the processor. The drawing device may be a back lighted liquid crystal display or a high resolution cathode ray tube or an infrared diode laser raster scanner and electronically draws an image of the artwork representation for the interconnections onto the electronically erasable mask. The projecting system projects ultra-violet light energy onto the electronically erasable mask so that the electronically erasable mask transfers a single frame exposure of the image in order to reflect the ultra-violet light energy onto the curable liquid in the solidification plane thereby forming the photo-resist pattern on the substrate.

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