Metal working – Barrier layer or semiconductor device making
Patent
1989-05-04
1991-09-17
Chaudhuri, Olik
Metal working
Barrier layer or semiconductor device making
29 2502, 20419225, 427 541, C23C 1400
Patent
active
050481630
ABSTRACT:
A system for processing the surface of semiconductor material for annealing and etching purposes. The system established a high intensity ultraviolet light which is repetitively pulsed to rapidly raise the surface temperature of the semiconductor material to a predetermined temperature for either etching or annealing purposes.
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Asmus John F.
Lovberg Ralph H.
Bunch William
Chaudhuri Olik
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