System for processing semiconductor materials

Metal working – Barrier layer or semiconductor device making

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Details

29 2502, 20419225, 427 541, C23C 1400

Patent

active

050481630

ABSTRACT:
A system for processing the surface of semiconductor material for annealing and etching purposes. The system established a high intensity ultraviolet light which is repetitively pulsed to rapidly raise the surface temperature of the semiconductor material to a predetermined temperature for either etching or annealing purposes.

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