System for processing a workpiece

Details System for processing a workpiece System for processing a workpiece

2007-01-05

2010-12-14

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S192000

Reexamination Certificate

active

07849865

ABSTRACT:
A wafer processing system has a moveable drain assembly having multiple drain rings. The drain rings may be spaced apart sufficiently to allow a process fluid applicator to move between them. Each drain ring provides a separate drain path, optionally in a separate recirculation loop carrying a single process fluid. The drain rings may be sequentially moved into position to collect process fluid moving off of the workpiece. As a result, process fluids may be more uniformly applied and used process fluids can be separately removed, collected, and either recycled or processed for disposal. Mixing of used process fluids is largely avoided. A lower process fluid outlet allows for processing the back side of the wafer as well, without flipping the wafer.

REFERENCES:
patent: 4903717 (1990-02-01), Sumnitsch
patent: 6537416 (2003-03-01), Mayer et al.
patent: 6810888 (2004-11-01), Tsuchiya et al.
patent: 6930046 (2005-08-01), Hanson et al.
patent: 7122084 (2006-10-01), Hohenwarter
patent: 7144459 (2006-12-01), Thompson et al.
patent: 2004/0065540 (2004-04-01), Mayer et al.
patent: 2005/0031497 (2005-02-01), Siebert et al.
patent: 2005/0199503 (2005-09-01), Woodruff
patent: 2007/0175500 (2007-08-01), Hohenwarter
patent: 19801360 (1999-07-01), None

Affiliated with

Also associated with

Rating

System for processing a workpiece does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for processing a workpiece, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for processing a workpiece will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4237300