System for preventing backflow in an ion source

Details System for preventing backflow in an ion source System for preventing backflow in an ion source

2009-09-23

2011-11-15

Nguyen, Kiet (Department: 2881)

Radiant energy

Ionic separation or analysis

With sample supply means

Reexamination Certificate

active

08058611

ABSTRACT:
A system for preventing backflow as part of an ion source arrangement is introduced. Such a system incorporates a novel continuous flow guide within a source, such as an API ion source. In the spray direction, the cross-sectional area that defines the first portion of the internal volume initially decreases in a convergent-like manner and thereafter increases in a divergent-like manner towards the exit opening of the source housing. Such a flow guide has been designed as an integral part of an ion source housing to provide for an optimal unidirectional flow past a sampling orifice of a mass spectrometer inlet. Accordingly, the novel design of the present invention prevents recirculation and thus minimizes carryover, chemical noise, and source turbulence and as an added benefit, enables a user to easily clean such a system during maintenance.

REFERENCES:
patent: 5412208 (1995-05-01), Covey et al.
patent: 6759650 (2004-07-01), Covey et al.
patent: 7145138 (2006-12-01), Thakur
patent: 7199364 (2007-04-01), Thakur
patent: 7339521 (2008-03-01), Scheidemann et al.
patent: 7465940 (2008-12-01), Franzen
patent: 2009/0194687 (2009-08-01), Jolliffe et al.
patent: 2009/0212210 (2009-08-01), Finlay et al.
patent: 2010/0163719 (2010-07-01), Loucks et al.
patent: WO 2008/124264 (2008-10-01), None
patent: WO 2008/129039 (2008-10-01), None

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