System for photopyrolitically removing a contaminant

Electric resistance heating devices – Heating devices – Radiant heater

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392417, 392424, F21V 712

Patent

active

057518971

ABSTRACT:
A system for safely removing even a hazardous contaminant from a substrate surface includes a light energy source whose output is controlled to selectively provide components primarily in the visible and infrared spectrum, and a power unit for energizing the light energy source at a desired energy level, pulse width and pulse repetition rate. Proper selection of these parameters permits the energy source to heat the contaminant sufficiently to cause direct carbonization without entering a melt phase, without the need for any precoat medium. Because the resultant molecular decomposition of the contaminant occurs relatively faster than heat transfer to the underlying substrate, substantially no substrate heating results. The light source energy transforms the contaminant to an ash that is removed from the substrate by a vacuum system preferably surrounding the light source. The light source is preferably a xenon flash lamp operated with a pulse repetition rate of between about 0.1 pulses/second and 12 pulses/second, an energy pulse duration of about 400 .mu.s to about 800 .mu.s, and a peak energy per pulse exceeding about 3,750 joule. The system also provides a mechanism for selectively emphasizing either the visible light or the infrared light spectrum output from the light energy source, to further customize the energy output to the contaminant being removed. A robotic mechanism preferably moves the light energy source over the substrate in applications where a long dwell time is desired to vitrify a contaminant.

REFERENCES:
patent: 4867796 (1989-09-01), Asmus et al.
patent: 5024968 (1991-06-01), Engelsberg
patent: 5068040 (1991-11-01), Jackson
patent: 5147125 (1992-09-01), Austin
patent: 5151135 (1992-09-01), Magee
patent: 5328517 (1994-07-01), Cates

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