Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Reexamination Certificate
2005-03-08
2005-03-08
Pert, Evan (Department: 2829)
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
Reexamination Certificate
active
06864702
ABSTRACT:
The present invention provides a system for stress testing an oxide structure to determine that structure's reliability in overstress conditions. The present invention provides an overstress test structure (400) that comprises a first transistor (406), having a first terminal coupled to ground, a second terminal coupled to a control signal (402), and a third terminal coupled to a first end of a first resistive element (412). A first voltage source (414) is coupled to the second end of the first resistive element. A second resistive element (416) is intercoupled between the second end of the first resistive element and ground. A second transistor (418) has a first terminal coupled to the second end of the first resistive element, a second terminal coupled to the first end of the first resistive element, and a third terminal coupled to a first node (420). A third resistive element (422) is intercoupled between the third terminal of the second transistor and ground; and a third transistor (424) has a first terminal coupled (426) to the oxide structure, a second terminal coupled to the first end of the first resistive elerment, and a third terminal coupled to a second voltage source (428).
REFERENCES:
patent: 5381105 (1995-01-01), Phipps
patent: 5598102 (1997-01-01), Smayling et al.
patent: 5648275 (1997-07-01), Smayling et al.
patent: 5798649 (1998-08-01), Smayling et al.
patent: 20040085084 (2004-05-01), Wang et al.
Adams Reed W.
Rajasekhar Suribhotla V.
Teggatz Ross E.
Brady III W. James
Moore J. Dennis
Pert Evan
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
LandOfFree
System for oxide stress testing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for oxide stress testing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for oxide stress testing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3409357