System for monitoring foreign particles, process processing...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

08045148

ABSTRACT:
A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.

REFERENCES:
patent: 5233191 (1993-08-01), Noguchi et al.
patent: 5463459 (1995-10-01), Morioka et al.
patent: 5858863 (1999-01-01), Yokoyama et al.
patent: 5963314 (1999-10-01), Worster et al.
patent: 5973785 (1999-10-01), Okamoto
patent: 6458610 (2002-10-01), Lensing et al.
patent: 6509201 (2003-01-01), Wright
patent: 6532428 (2003-03-01), Toprac
patent: 6625512 (2003-09-01), Goodwin
patent: 6650409 (2003-11-01), Morioka et al.
patent: 6657716 (2003-12-01), Lensing et al.
patent: 6801826 (2004-10-01), Tanabe
patent: 6894302 (2005-05-01), Ishimaru et al.
patent: 6894773 (2005-05-01), Morioka
patent: 7353954 (2008-04-01), Malek et al.
patent: 7751036 (2010-07-01), Hamamatsu et al.
patent: 2001/0019411 (2001-09-01), Nara et al.
patent: 2002/0029086 (2002-03-01), Ogushi et al.
patent: 2002/0032495 (2002-03-01), Ozaki
patent: 2002/0042664 (2002-04-01), Kikuchi
patent: 2002/0143650 (2002-10-01), Matsuda
patent: 2003/0061212 (2003-03-01), Smith et al.
patent: 2004/0036863 (2004-02-01), Matsusita et al.
patent: 05-218163 (1993-08-01), None
patent: 05-259259 (1993-10-01), None
patent: 06-258239 (1994-09-01), None
patent: 06-275688 (1994-09-01), None
patent: 06-324003 (1994-11-01), None
patent: 08-145900 (1996-06-01), None
patent: 08-250385 (1996-09-01), None
patent: 08-250569 (1996-09-01), None
patent: 10-233420 (1998-09-01), None
patent: 11-312716 (1999-11-01), None
patent: 2000-222033 (2000-08-01), None
patent: 2002-075820 (2002-03-01), None
patent: 2002-190509 (2002-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System for monitoring foreign particles, process processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for monitoring foreign particles, process processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for monitoring foreign particles, process processing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4287256

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.