Measuring and testing – Volume or rate of flow – With indirect temperature or density compensation
Patent
1994-07-11
1996-09-17
Chilcot, Richard
Measuring and testing
Volume or rate of flow
With indirect temperature or density compensation
73199, G01F 186
Patent
active
055570500
ABSTRACT:
A metering system, for metering a volume V.sub.o of compressed gas supplied under high pressure from a first tank to a second tank, includes a first duct for supplying the compressed gas from the first tank to the second tank, the first duct having a pressure regulator providing a relatively high driving pressure P, and a first nozzle having a section S with an inner diameter located downstream of the pressure regulator and providing a downstream pressure p therefrom, the pressure regulator being controlled by the downstream pressure p to maintain driving pressure P so that the downstream pressure p remains less than 0.95 P. A second duct branches at one end from the first duct between the pressure regulator and the first nozzle and includes a second nozzle having a section s with an inner diameter smaller than the inner diameter of the section S of the first nozzle. An outlet of the second nozzle is maintained under relatively low pressure conditions, and a volume meter is connected to the outlet of the second nozzle for metering under low pressure conditions a volume v.sub.o of gas flowing through the second duct. The volume V.sub.o which flows to the second tank under such low pressure conditions is determined by V.sub.o =v.sub.o (S/s).
REFERENCES:
patent: 2862387 (1958-12-01), Webster
patent: 3750472 (1973-08-01), Ducousset
patent: 4131015 (1978-10-01), Chawla et al.
patent: 4527600 (1985-07-01), Fisher et al.
patent: 4706492 (1987-11-01), Jones, Jr. et al.
patent: 5307833 (1994-05-01), Stoy et al.
Campain Jean-Pierre
Fournier Jacques
Janssen Sylvan
Chilcot Richard
Patel Harshad
Schlumberger Industries
LandOfFree
System for metering gas supplied under high pressure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for metering gas supplied under high pressure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for metering gas supplied under high pressure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-414670