System for maintaining the optical alignment between stationary

Details System for maintaining the optical alignment between stationary System for maintaining the optical alignment between stationary

1986-05-12

1987-10-27

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

219121LU, 219121LR, G01J 120, B23K 900

Patent

active

047031662

ABSTRACT:
A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable of line definition at the 0.5-micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.

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patent: 4540867 (1985-09-01), Ackerman
patent: 4618759 (1986-10-01), Muller et al.

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