X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1983-11-04
1986-07-08
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 82, 378 45, G01M 2300
Patent
active
045997411
ABSTRACT:
A system for X-ray fluorescence analysis utilizes a plurality of parfocal diffractors to selectively monochromatize X-rays and focus them on a sample to be analyzed. In a preferred embodiment, each diffractor comprises a toroidally shaped crystal structure which, in the operative position of the diffractor, satisfies Johannson geometric conditions within a plurality of planes containing both a source of X-rays and a focused X-ray image.
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Church Craig E.
USC--Dept. of Materials Science
Wieland Charles F.
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