System for impedance matching and power control for apparatus fo

Details System for impedance matching and power control for apparatus fo System for impedance matching and power control for apparatus fo

1998-01-15

1999-08-10

Gensler, Paul

Wave transmission lines and networks

Automatically controlled systems

Impedance matching

333 32, H03H 740

Patent

active

059364815

ABSTRACT:
The invention provides an impedance matching and power control system not resorting to mechanical control for a device for high frequency plasma treatment. An impedance matching unit 14 inserted in the terminal end of a power feed line 3 extending from a high frequency power oscillator 1 to a plasma chamber 2 comprises phase detecting means 17, a load-associated detector 19 having the function of detecting voltage, current, and phase angle, and an arithmetic and output section 21, whereby the impedance matching unit delivers a frequency control signal corresponding to the detected phase and a power signal representing the consumed power of the plasma chamber as calculated from the voltage, current and phase angle. The high frequency power oscillator comprises an oscillation control section 24 for controlling the oscillation frequency thereof according to said frequency control signal, and an output control section including a summing amplifier 25 which receives an external set power signal and the detected power signal to find the difference between the two values of power, thus controlling its own output power according to the difference.

REFERENCES:
patent: 5473291 (1995-12-01), Brounley
patent: 5585766 (1996-12-01), Shel
patent: 5654679 (1997-08-01), Mauretic et al.
patent: 5689215 (1997-11-01), Richardson et al.

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