Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1995-12-21
1999-01-12
Warden, Jill
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 42, 134184, B08B 312
Patent
active
058581049
ABSTRACT:
A pressure generating system uses a shock wave chamber filled with a liquid pressurized to a static pressure different from ambient atmospheric pressure. Once a a preferred location is established in the chamber, a pulsed compressional acoustic shock wave introduced into the liquid is reflected from a free surface of the liquid as a dilatation wave focused on a point at which a bubble forms and expands about an object. The static pressure causes the bubble to collapse around the object to generate a high pressure thereat.
REFERENCES:
patent: 3037922 (1962-06-01), Johnson
patent: 3346458 (1967-10-01), Schmidt
patent: 3378446 (1968-04-01), Whittlesey
patent: 3624239 (1971-11-01), Fraos
patent: 3762992 (1973-10-01), Hedstrom
patent: 4333796 (1982-06-01), Flynn
patent: 4344911 (1982-08-01), Maniscalco
patent: 4367130 (1983-01-01), Lemelson
patent: 4691724 (1987-09-01), Garcia et al.
patent: 4874596 (1989-10-01), Lemelson
patent: 5523058 (1996-06-01), Umemura et al.
Dingee Fusim Power--C & DN Apr. 2, 1979--vol. 1 No. 2 pp. 32-47.
Browne New Shot at Cold Fusim--The New York Times Dec. 20, 1994--pp. C1 & 0.1
Chaudhry Saeed T.
Forrest John
Shuster Jacob
The United States of America as represented by the Secretary of
Warden Jill
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