Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-10-16
1998-06-30
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419213, 427 9, 427 10, 118665, 118688, 118696, 118708, 118712, 118713, C23C 1454
Patent
active
057728615
ABSTRACT:
A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.
REFERENCES:
patent: 4311725 (1982-01-01), Holland
patent: 4936964 (1990-06-01), Nakamura
patent: 5154810 (1992-10-01), Kamerling et al.
patent: 5507870 (1996-04-01), Siebert
Bjornard Erik J.
Clayton Kelly R.
Gammans Charles C.
Meredith, Jr. William A.
Powers Kim D.
Breneman R. Bruce
McDonald Rodney G.
Viratec Thin Films, Inc.
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