System for developing a photo-resist material used as a recordin

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...

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354317, 354325, 134 57R, 134113, 134151, 250571, G03D 504

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045014809

ABSTRACT:
A system for developing a photo-resist material of an optical recording medium on which digital information is recorded in the form of a series of pits whose position and length represent the digital information. In order to precisely control the size of the pits formed during the developing process, a diffraction beam of the monitoring energy beam passing through the pits is received by a sensor means which monitors the intensity of the diffraction beam and which produces a signal for controlling the supply of developing solution on the recording medium. A partition means is provided for isolating the path of the monitoring energy beam so as to eliminate absorption, diffraction or scattering effects due to the particles of developing solution sprayed on the surface of the recording medium.

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patent: 4136940 (1979-01-01), Lin
patent: 4142107 (1979-02-01), Hatzakis et al.

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