System for detecting defects in a regularly arranged pattern suc

Details System for detecting defects in a regularly arranged pattern suc System for detecting defects in a regularly arranged pattern suc

1989-10-13

1990-05-29

McGraw, Vincent P.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356347, 350364, G01B 902

Patent

active

049290819

ABSTRACT:
A pattern defect detecting system for an integrated semiconductor circuit or the like, utilizing the phenomenon that in the case of a test pattern having regularity, the intensity of diffracted light appearing on a back-focal plane of a lens is high, while defects or foreign matters not having regularity are low in the intensity of diffracted light. As a concrete example, an optical space modulator is used to record only an intense light portion in real time. The recorded diffraction pattern can be erased easily by, for example, application of voltage and radiation of light. A spatial filter can be prepared in real time in 1:1 correspondence to a test sample. Besides, even in the case of change of test pattern, an immediate action can be taken for continuous detection of defects, thus permitting test on-line.

REFERENCES:
patent: 4330205 (1982-05-01), Murakami et al.
patent: 4330775 (1982-05-01), Iwamoto et al.
patent: 4360269 (1982-11-01), Iwamoto et al.
patent: 4448527 (1984-05-01), Milana
patent: 4674824 (1987-06-01), Goodman et al.
Journal of Photographic Science; vol. 34, 1986, pp. 1-10 "Inspection of Integrated Photomasks Using Optical Data Processing Techniques"-Watson et al.
Lyman, Electronics, Mar. 5, 1987, pp. 75-76 "Moving Wafer Inspection Into the Fast Lane".
Optical Engineering, Sep./Oct. 1985, vol. 24, No. 5, pp. 731-734 "Holographic Optical Processing for Submicrometer Defect Detection"-Fusek et al.

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