System for design and production of integrated circuit photomask

Details System for design and production of integrated circuit photomask System for design and production of integrated circuit photomask

1981-01-02

1982-08-10

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430311, 430312, 430394, 430396, 357 85, G03C 500

Patent

active

043438776

ABSTRACT:
System for design and production of integrated circuit photomasks and integrated circuit devices wherein the four adjacent corners of each circuit topography pattern on each photomask and each wafer chip area are set aside as designated information locations. One of the designated information locations containing a two-dimensional rectangular array of locations for use as a mask sequence array and a second of the designated information locations containing a two-dimensional rectangular array of locations for use as an alignment key pattern array. The third designated information location serves as a product identification area which may include a manufacturer name and a product identification code. The fourth designated information location is adapted to serve as a test device area and may also serve as a part identification area in semiconductor processes employing a two layer metal interconnect system.

REFERENCES:
patent: 3697318 (1972-10-01), Feinberg et al.
patent: 3968478 (1976-07-01), Mensch
IBM Technical Disclosure Bulletin, vol. 14, No. 4, Sep. 1971, "Wafer Identification", pp. 1030, 1031.

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