Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-03-08
2005-03-08
Edwards, Laura (Department: 1734)
Coating apparatus
Gas or vapor deposition
C118S7230VE, C118S725000
Reexamination Certificate
active
06863731
ABSTRACT:
The present invention reduces corrosion rates on metal surfaces, such as the interior surfaces of gas flow control components by depositing a chemically inert layer on the metal surface of the component and other associated parts of the component that are exposed to corrosive gases. The disclosed method provides for depositing a relatively chemically inert thin film such as silicon dioxide along the gas exposed surface areas of the metal surface thereby enhancing corrosion protection to the metal surfaces. The present invention can be used to deposit a chemically inert thin film at locations inside components that are outside a direct line of sight and at locations normally unreachable by a gas flowing through the components. The present invention does not require a vacuum system for the deposition of the corrosion-resistant thin film.
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Elsayed-Ali Hani E.
Waldbusser Edwin
Controls Corporation of America
Edwards Laura
Kondracki Edward J.
Miles & Stockbridge P.C.
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