System for deflecting a beam of charged particles

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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G21K 108, H01J 314

Patent

active

046396020

ABSTRACT:
The invention relates to a system for the deflection of a beam of charged particles, which deflects a particle beam entering at any point into the deflection system such that it impinges upon the entrance orifice of a detector disposed at the exit from the deflection system. The deflection system comprises eight rotationally symmetrically disposed deflection plates and preferably includes two sections in order to achive a large range of uniform field strength in the deflection and a perpendicular impingement of the beam on the detector orifice.

REFERENCES:
patent: 2919381 (1959-12-01), Glaser
patent: 4393308 (1983-07-01), Anger et al.
Advances in Image Pickup and Display, B. Kazan, Ed., vol. 1, pp. 196-203, (1974).
A Practical Focus-Deflection System for Shaped Electron Beams, T. Soma, Optik, vol. 53, No. 4, pp. 281-284 (1979).
Preliminary Study for the Construction of a Low-Energy Electron-Diffraction Apparatus Using a High-Tension Source, C. Berger et al, J. Appl. Phys., Dec., 1977, pp. 5027-5032.
Epitaxy of Si(111) as Studied with a New High Resolving Leed System, K. D. Gronwald et al, Surface Science 117 (1982), pp. 180-187.
Ion Optics of Ion Microprobe Instruments, H. Liebl, Vacuum, vol. 33, No. 9, (1983), pp. 525-531.

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