System for controlling reflection reticle temperature in microli

Details System for controlling reflection reticle temperature in microli System for controlling reflection reticle temperature in microli

1998-11-11

2000-08-08

Doerrler, William

Refrigeration

Using electrical or magnetic effect

Thermoelectric; e.g., peltier effect

62 62, 62 37, F25B 2102

Patent

active

060984082

ABSTRACT:
A system for regulating reticle temperature is provided. The system includes a reticle for use in a lithographic process and a chuck assembly for supporting the reticle. The chuck assembly includes: a backplate having front and back surfaces, the front surface engaging with a backside of the reticle; and a thermoelectric cooling system operatively coupled to the backplate for regulating temperature of at least a portion of the reticle via heat conduction through the backplate. The chuck assembly also includes a temperature sensing system coupled to the backplate for sensing temperature of at least a portion of the reticle via heat conduction through the backplate; and a heat sink operatively coupled to the thermoelectric cooling system. A voltage driver operatively is coupled to the thermoelectric cooling system, the voltage driver provides a bias voltage to drive the thermoelectric cooling system. A processor is operatively coupled to the voltage driver, the processor employing the voltage driver in controlling the thermoelectric cooling system.

REFERENCES:
patent: 5689957 (1997-11-01), DeVilbiss et al.
patent: 5689958 (1997-11-01), Gaddis et al.
patent: 5690849 (1997-11-01), DeVilbiss et al.
patent: 5822993 (1998-10-01), Atty
patent: 5867990 (1999-02-01), Ghoshal
patent: 5940784 (1999-08-01), El-Husayni

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