System for cleaning and etching

Details System for cleaning and etching System for cleaning and etching

1996-09-18

1999-03-23

Knode, Marian C.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

C23F 100

Patent

active

058854037

ABSTRACT:
A system for cleaning and etching a wafer. The system includes few buffer tanks to complete the cleaning and etching process. The system further includes a loader for loading the wafer, each buffer tank storing a unique chemical solution. At least one process tank is provided for retaining the loaded wafer, and is coupled to the buffer tank to receive the chemical solution from said buffer tank and to perform the cleaning and etching of the wafer.

REFERENCES:
patent: 4325746 (1982-04-01), Popplewell et al.
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5361787 (1994-11-01), Miyazaki et al.

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