Pumps – Expansible chamber type – Having pumping chamber pressure responsive distributor
Reexamination Certificate
2005-02-08
2005-02-08
Hassanzadeh, Parviz (Department: 1763)
Pumps
Expansible chamber type
Having pumping chamber pressure responsive distributor
C427S575000, C427S576000, C427S577000, C118S7230MR, C118S728000
Reexamination Certificate
active
06851939
ABSTRACT:
A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an organic material supply system for providing organic material of gas or liquid phase; and a DC bias system for inducing the metal ion and the radical ion on a substrate is provided, and a method for fabricating metal composite film comprising: a step of providing a process chamber with the gas as plasma form using the ECR; a step of providing the chamber with the metal ion and the organic material; a step of generating organic material ion and radical ion by reacting the metal ion and the organic material with the plasma; and a step of chemically compounding the organic material ion and the radical ion after inducing them on a surface of a specimen is also provided.
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Cho Byung-Won
Jeon Bup-Ju
Lee Joong-Kee
Park Dal-Keun
Woo Joo-Man
Hassanzadeh Parviz
Korea Institute of Science and Technology
Scully Scott Murphy & Presser
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