System for and method of investigating the exact same point...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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Reexamination Certificate

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07057717

ABSTRACT:
Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.

REFERENCES:
patent: 5078513 (1992-01-01), Spaulding et al.
patent: 5091801 (1992-02-01), Ebstein
patent: 5864436 (1999-01-01), Noyes
patent: 5963327 (1999-10-01), He et al.
patent: 5973846 (1999-10-01), McConica
patent: 6590708 (2003-07-01), Nakai et al.

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