System for ablative imaging by proximity lithography

Details System for ablative imaging by proximity lithography System for ablative imaging by proximity lithography

1995-12-20

1997-05-27

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Combined

430 5, 430945, 21912168, 250504R, B23K 2616

Patent

active

056331231

ABSTRACT:
A system for prolonging the useful life of a mask while ablating a pattern into a workpiece. The system includes a workpiece, a debris-blocking layer thereon, a laser directed toward the workpiece, and a mask provided between the laser and debris-blocking layer. The workpiece may be a data storage disk comprising a substrate and a magnetic coating thereon. The laser may be an ultraviolet laser and the debris-blocking layer should be transparent to the light emitted by the laser. The pattern may include concentric or spiral optical servo tracks in the magnetic coating. The debris-blocking layer minimizes degradation of the mask, thereby minimizing the need to clean the mask and prolonging the useful life of the mask.

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