System, apparatus and method for maskless lithography that...

Details System, apparatus and method for maskless lithography that... System, apparatus and method for maskless lithography that...

2007-09-25

2007-09-25

Thompson, Timothy (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S291000, C359S223100, C359S224200

Reexamination Certificate

active

11018483

ABSTRACT:
A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.

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