Fluid handling – Processes
Reexamination Certificate
2006-05-16
2006-05-16
Lee, Kevin (Department: 3753)
Fluid handling
Processes
C137S240000, C137S883000, C137S565010
Reexamination Certificate
active
07044147
ABSTRACT:
A system, apparatus, and method for reducing contaminants of semiconductor device fabrication equipment components, featuring a manifold having a passageway in fluid communication with to a plurality of inlets and for providing a purge fluid to removably connected components to undergo contaminant reduction. The inlets are connected to a plurality of manifold valves to which components are removably connected. The manifold valves are operable to place connected components into and out of fluid communication with the inlets and the passageway. A fluid source supplies purge fluid to the manifold and a pump is connected to the manifold to remove fluid from the system. In one embodiment an oven is connected to the system for outgassing and for reduction of moisture in additional components.
REFERENCES:
patent: 3888518 (1975-06-01), Delessert
patent: 4352532 (1982-10-01), Hardin
patent: 4383547 (1983-05-01), Lorenz et al.
patent: 4437479 (1984-03-01), Bardina et al.
patent: 4852516 (1989-08-01), Rubin et al.
patent: 5137047 (1992-08-01), George
patent: 5449294 (1995-09-01), Rench et al.
patent: 5453124 (1995-09-01), Moslehi et al.
patent: 5881476 (1999-03-01), Strobush et al.
patent: 5992463 (1999-11-01), Redemann et al.
patent: 6099599 (2000-08-01), Wu
patent: 6199255 (2001-03-01), Wang et al.
patent: 6325886 (2001-12-01), Harris et al.
patent: 6349744 (2002-02-01), Grosshart
patent: 6442867 (2002-09-01), Pressnall et al.
patent: 6598279 (2003-07-01), Morgan
patent: 6607605 (2003-08-01), Tan
Brucher Richard A.
Enicks Darwin G.
Friedrichs Carl E.
Atmel Corporation
Lee Kevin
McCarthy Gina
Schneck Thomas
Schneck & Schneck
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