Chemistry of inorganic compounds – Halogen or compound thereof – Chlorine dioxide
Reexamination Certificate
2005-07-05
2005-07-05
Nguyen, Ngoc-Yen (Department: 1754)
Chemistry of inorganic compounds
Halogen or compound thereof
Chlorine dioxide
C423S472000, C423S462000, C204S634000
Reexamination Certificate
active
06913741
ABSTRACT:
A system and process for oxidizing inorganic or organic species is disclosed. The system and process includes feeding a dilute aqueous alkali metal halite solution into a cation exchange column, wherein the cation exchange column contains a cation exchange material; contacting the dilute aqueous alkali metal halite solution with the cation exchange material to produce an effluent containing halous acid; feeding the effluent containing halous acid into a catalytic reactor containing a catalytic material; and contacting the halous acid containing effluent with the catalytic material to produce a halogen oxide.
REFERENCES:
patent: 2717237 (1955-09-01), Rempel
patent: 3386915 (1968-06-01), Rutschi
patent: 3684437 (1972-08-01), Callerame
patent: 3763006 (1973-10-01), Callerame
patent: 3878072 (1975-04-01), Cook, Jr. et al.
patent: 3884777 (1975-05-01), Harke et al.
patent: 3904496 (1975-09-01), Harke et al.
patent: 4032452 (1977-06-01), Davis
patent: 4115217 (1978-09-01), Larsson et al.
patent: 4234446 (1980-11-01), Ramras
patent: 4250144 (1981-02-01), Ratigan
patent: 4308117 (1981-12-01), Sweeney
patent: 4362707 (1982-12-01), Hardee et al.
patent: 4381290 (1983-04-01), Hardee et al.
patent: 4426263 (1984-01-01), Hardee et al.
patent: 4432856 (1984-02-01), Murakami et al.
patent: 4526904 (1985-07-01), Kishida et al.
patent: 4542008 (1985-09-01), Capuano et al.
patent: 4632876 (1986-12-01), Laird et al.
patent: 4683039 (1987-07-01), Twardowski et al.
patent: 4725390 (1988-02-01), Laird et al.
patent: 4767510 (1988-08-01), Lipsztajn
patent: 4806215 (1989-02-01), Twardowski
patent: 4853096 (1989-08-01), Lipsztajn et al.
patent: 5008096 (1991-04-01), Ringo
patent: 5041196 (1991-08-01), Cawlfield et al.
patent: 5077258 (1991-12-01), Phillips et al.
patent: 5078908 (1992-01-01), Ripley et al.
patent: 5084149 (1992-01-01), Kaczur et al.
patent: 5092970 (1992-03-01), Kaczur et al.
patent: 5106465 (1992-04-01), Kaczur et al.
patent: 5158658 (1992-10-01), Cawlfield et al.
patent: 5185161 (1993-02-01), Davidson et al.
patent: 5242552 (1993-09-01), Coin et al.
patent: 5242553 (1993-09-01), Kaczur et al.
patent: 5248397 (1993-09-01), Cawlfield et al.
patent: 5264089 (1993-11-01), Kaczur et al.
patent: 5296108 (1994-03-01), Kaczur et al.
patent: 5348659 (1994-09-01), Kunz et al.
patent: 5354435 (1994-10-01), Kaczur et al.
patent: 5391533 (1995-02-01), Peterson et al.
patent: 5419816 (1995-05-01), Sampson et al.
patent: 5435984 (1995-07-01), Daly et al.
patent: 5609742 (1997-03-01), Sampson et al.
patent: 5705050 (1998-01-01), Sampson et al.
patent: 5858191 (1999-01-01), DiMascio et al.
patent: 5858246 (1999-01-01), Rafter et al.
patent: 5868915 (1999-02-01), Ganzi et al.
patent: 6024850 (2000-02-01), Sampson et al.
patent: 6171485 (2001-01-01), Kuke
patent: 6203688 (2001-03-01), Lipsztajn et al.
patent: 6265343 (2001-07-01), Daly et al.
patent: 6294108 (2001-09-01), Speronello et al.
patent: 6740223 (2004-05-01), Lipsztajn et al.
patent: 2001/0005499 (2001-06-01), Ostgard
patent: 2003/0006144 (2003-01-01), Tremblay et al.
patent: 2003/0064018 (2003-04-01), Sampson et al.
Cantor & Colburn LLP
Halox Technologies, Inc.
Nguyen Ngoc-Yen
LandOfFree
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