Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-05-02
2006-05-02
Stafira, Michael P. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400
Reexamination Certificate
active
07038772
ABSTRACT:
Two or more defect maps may be provided for the same sample surface at different detection sensitivities and/or processing thresholds. The defect maps may then be compared for better characterization of the anomalies as scratches, area anomalies or point anomalies. This can be done without concealing the more significant and larger size defects amongst numerous small and immaterial defects. One or more defect maps can be used to report the anomalies with classified information; the results from this map(s) can be used to monitor the process conditions to obtain better yield.
REFERENCES:
patent: 4449818 (1984-05-01), Yamaguchi et al.
patent: 5301129 (1994-04-01), McKaughan et al.
patent: 5699447 (1997-12-01), Alumot et al.
patent: 5808735 (1998-09-01), Lee et al.
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5907628 (1999-05-01), Yolles et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6195444 (2001-02-01), Simanovsky et al.
patent: 6201601 (2001-03-01), Vaez-Iravani et al.
patent: 6266437 (2001-07-01), Eichel et al.
“Acoustic Scanners and Modulators,” M. Gottlieb, Optical Scanning, ed. by Gerald F. Marshall, Dekker 1991, pp. 615-685.
“CMP Applications for Sub-0.25.mu.m Process Technologies,” D. Pramanik et al., presented at Electrochemical Society Proceedings: Chemical Mechanical Planarization in IC Device Manufacturing (2.sup.nd International Symposium), vol. 98-7, 1998.
Integrated CMP Defect Monitoring Strategy, W. Chen et al., presented at The Electrochemical Society Proceedings: Chemical Mechanical Polishing in IC Device Manufacturing III, Editors: V.A. Arimoto et la, PV99-37, Honolulu, Oct. 1999.
Akbulut Mustafa
Chen Wayne
Zeng Andrew
KLA-Tencor Corporation
Parsons Hsue & De Runtz LLP
Stafira Michael P.
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