System and methods for classifying anomalies of sample surfaces

Details System and methods for classifying anomalies of sample surfaces System and methods for classifying anomalies of sample surfaces

2008-01-01

2008-01-01

Stafira, Michael P. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07315365

ABSTRACT:
Two or more defect maps may be provided for the same sample surface at different detection sensitivities and/or processing thresholds. The defect maps may then be compared for better characterization of the anomalies as scratches, area anomalies or point anomalies. This can be done without concealing the more significant and larger size defects amongst numerous small and immaterial defects. One or more defect maps can be used to report the anomalies with classified information; the results from this map(s) can be used to monitor the process conditions to obtain better yield.

REFERENCES:
patent: 4449818 (1984-05-01), Yamaguchi et al.
patent: 5301129 (1994-04-01), McKaughan et al.
patent: 5699447 (1997-12-01), Alumot et al.
patent: 5808735 (1998-09-01), Lee et al.
patent: 5864394 (1999-01-01), Jordan et al.
patent: 5907628 (1999-05-01), Yolles et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6195444 (2001-02-01), Simanovsky et al.
patent: 6201601 (2001-03-01), Vaez-Iravani et al.
patent: 6266437 (2001-07-01), Eichel et al.
patent: 6271916 (2001-08-01), Marxer et al.
patent: 6590645 (2003-07-01), Chen et al.
“Acoustic Scanners and Modulators,” M. Gottlieb, Optical Scanning, ed. by Gerald F. Marshall, Dekker 1991, pp. 615-685.
“CMP Applications for Sub-0.25.mu.m Process Technologies,” D. Pramanik et al., presented at Electrochemical Society Proceedings: Chemical Mechanical Planarization in IC Device Manufacturing (2.sup.nd International Symposium), vol. 98-7, 1998.
Integrated CMP Defect Monitoring Strategy, W. Chen et al., presented at The Electrochemical Society Proceedings: Chemical Mechanical Polishing in IC Device Manufacturing III, Editors: V.A. Arimoto et 1a., PV99-37, Honolulu, Oct. 1999.

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