System and methods for analyzing copper chemistry

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Involving measuring – analyzing – or testing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S775000, C205S788500, C205S789500, C356S300000

Reexamination Certificate

active

07022215

ABSTRACT:
The present invention relates to methods for removing the matrix effects caused by variance in copper concentration and acidity during measurement of the organic additive concentration in a sample copper plating solution.

REFERENCES:
patent: 4589958 (1986-05-01), Alexander et al.
patent: 5192403 (1993-03-01), Chang et al.
patent: 6280602 (2001-08-01), Robertson
patent: 6645364 (2003-11-01), Calvert et al.
Freeman, J.E., et al., Analytica Chimica Acta, 1985, vol. 177, pp. 121-128, especially pp. 121-122.
Cerna, N., Determination of Chlorides in an Acid Copper-plating Bath, Abstract from Povrchove Uprary, 1973, vol. 13(6), pp. 11-12.
Skoog, D.A., Principles of Instrumental Analysis, 3rdEd., 1985, pp. 332-337, especially p. 336.
Cheng, et al., Analysis of organic additives in Copper-plating brighteneer by High Performance Liquid Chromatography, Abstract from Sepu, 1999, vol. 17(6), pp. 602-603.
H. W. Seisler, Y. Ozaki, S. Kawata, and H.M. Heise.Near Infrared SpectroscopyWiley-VCH Verlag GmbH, Weinham, Germany, 2002.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and methods for analyzing copper chemistry does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and methods for analyzing copper chemistry, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and methods for analyzing copper chemistry will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3527558

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.